| 摘要 |
A method for forming a pattern includes forming an etching object layer on a substrate, applying a resist on an etching object layer, the resist including a photo-initiator, and a liquid pre-polymer including a vinyl functional group and a hydrophilic functional group, shaping the resist using a mold plate having an imprint formed therein, and hardening the resist to form a resist pattern while the mold plate shaping the resist corresponding to the imprint.
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