| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce image distortion due to temperature gradients in a substrate and an immersion liquid in an immersion projection exposure apparatus. <P>SOLUTION: The immersion lithography apparatus comprises a temperature controller configured to adjust temperatures of a member in the final stage of a projection exposure apparatus PL, a substrate, and the immersion liquid to a common target temperature. Controlling the temperatures of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperatures may include controlling the immersion liquid flow rate and liquid temperature via a feedback circuit. <P>COPYRIGHT: (C)2010,JPO&INPIT |
