| 摘要 |
PURPOSE: An image sensor and a method for manufacturing the same are provided to prevent the contact failure in the pad region of a metal thin film layer by depositing a metal layer, which is composed of a titanium nitride, in the pad region. CONSTITUTION: A planarized oxide film(100) with a contact(110), which is formed in a via, is formed on a substrate. A first metal layer is deposited on a region of the oxide film excluding a contact formed region. A second metal layer(300) is formed on the contact formed region. The first metal layer includes titanium. The second metal layer includes either of a titanium nitride or a titanium nitride alloy. An aluminum layer is deposited on the second metal layer.
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