发明名称 Landing pad for use as a contact to a conductive spacer
摘要 A landing pad for use as a contact to a conductive spacer adjacent a structure in a semiconductor device comprises two islands, each of which is substantially rectangularly shaped and is spaced apart from one another and from the structure. Conductive spacers are adjacent to each island and overlapping each other and overlapping with the conductive spacer adjacent to the structure. The contact to the landing pad is on the conductive spacers adjacent to the islands and spaced apart from the structure.
申请公布号 US7749779(B2) 申请公布日期 2010.07.06
申请号 US20080266443 申请日期 2008.11.06
申请人 SILICON STORAGE TECHNOLOGY, INC. 发明人 LEE DANA;LU WEN-JUEI;TSUI FELIX YING-KIT
分类号 H01L21/66;H01L21/336;H01L21/768;H01L29/76 主分类号 H01L21/66
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