METHOD OF REMOVING RESIDUAL LIQUID, EXPOSURE DEVICE USING THE SAME, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To preferably remove a liquid remaining on a substrate after an exposure processing in an exposure device employing a liquid immersion method.

SOLUTION: A method of removing a residual liquid to remove the liquid remaining on the substrate carrying out the exposure processing by the liquid immersion method. The method of removing the residual liquid includes: an alignment device aligning the substrate when carrying out the exposure processing to the substrate; and a device for removing the liquid to remove the liquid remaining on the substrate after carrying out the exposure processing. The device for removing the residual liquid includes: a first liquid removing step S901 of removing the liquid remaining on the substrate just after the exposure processing by the device for removing the liquid; and a residual-liquid detecting step S905 of acquiring the image information of the substrate after the first liquid removing step S901 by the alignment device and detecting the residual liquid on the substrate on the basis of the image information. The method of removing the residual liquid further includes a second liquid removing step S911 of removing the liquid remaining on the substrate by the device for removing the liquid when the residual liquid is detected on the substrate in the residual-liquid detecting step S905.

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