发明名称 HIGH ELECTRON MOBILITY TRANSISTOR, METHOD FOR PRODUCING HIGH ELECTRON MOBILITY TRANSISTOR, AND ELECTRONIC DEVICE
摘要 <p>Provided are a high electron mobility transistor (hetero-junction electrolytic transistor) with low access resistance, on resistance, or the like, a method for producing the high electron mobility transistor, and an electronic device. The high electron mobility transistor characterized in that an electron transit layer (11) is formed by a group-? nitride semiconductor on a substrate (10), an electron supply layer (12) formed from the group-? nitride semiconductor is joined to the upper surface of the electron transit layer (11) in terms of  hetero-junction, and a gate electrode (14), a source electrode (15A), and a drain electrode (15B) are disposed on the electron supply layer (12), that n-type conductive layer regions (13A, 13B) which extend from the upper part of the electron transit layer (11) to the upper surface of the electron supply layer (12) are provided in at least a part below the source electrode (15A) and the drain electrode (15B), and that the hetero-junction interface with the electron supply layer (12) contains n-type impurities at a concentration of 1 × 1020 cm-3 or more in the electron transit layer (11) part of the n-type conductive layer regions (13A, 13B).</p>
申请公布号 WO2010074275(A1) 申请公布日期 2010.07.01
申请号 WO2009JP71699 申请日期 2009.12.25
申请人 NEC CORPORATION;INOUE TAKASHI;MIYAMOTO HIRONOBU;OTA KAZUKI;NAKAYAMA TATSUO;OKAMOTO YASUHIRO;ANDO YUJI 发明人 INOUE TAKASHI;MIYAMOTO HIRONOBU;OTA KAZUKI;NAKAYAMA TATSUO;OKAMOTO YASUHIRO;ANDO YUJI
分类号 H01L21/338;H01L21/28;H01L29/778;H01L29/812 主分类号 H01L21/338
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