| 摘要 |
Disclosed is a film forming method comprising a step of producing a monovalent metal carboxylate gas by reacting a divalent metal carboxylate with a carboxylic acid, a step of depositing a monovalent metal carboxylate film (2) on a substrate (1) by supplying the monovalent metal carboxylate gas thereto, and a step of forming a metal film (3) by providing the substrate (1), on which the monovalent metal carboxylate film (2) is deposited, with energy, thereby decomposing the monovalent metal carboxylate film (2). |
