| 摘要 |
PROBLEM TO BE SOLVED: To provide a proximity exposure apparatus of which the throughput is increased. SOLUTION: A gap control means which elevates and lowers a substrate stage 2 so as to control the gap between a mask M and a substrate W finely and vertically moves the substrate stage 2 by a vertical fine movement device 8 for exposure on a first substrate W so as to control the gap to a first target value based on the measured value by the gap sensor 31. The gap control means also detects the height of the substrate stage 2 when the gap reaches the first target value and memorizes the height as a second target value. On transferring a pattern of the mask M by exposure onto the second and succeeding substrates W, the gap control means finely and vertically moves the substrate stage 2 by the vertical fine movement device 8 so as to control the height of the substrate stage 2 to the second target value. COPYRIGHT: (C)2006,JPO&NCIPI |
