发明名称 LOAD LOCK APPARATUS AND VACUUM PROCESSING SYSTEM
摘要 PURPOSE: A load lock device and a vacuum processing system are provided to prevent the generation of a particle due to an abrasion of a seal material by controlling the displacement of s seal surface on both ends of a partition. CONSTITUTION: A load lock device includes a vacuum preparing chamber with two up and down stages blocked with a partition(47). A pair of slits(101,102) are formed on the partition to vertically pass through the partition. The inside of the slit is a cavity and the upper and lower openings of the slit are sealed with an elastic plate. A reinforcement member is arranged to resist compressive force applied to the width direction of the slit. A partition includes a pressure control hole(50) from the inside of the slit to the seal surface.
申请公布号 KR20100064346(A) 申请公布日期 2010.06.14
申请号 KR20090119209 申请日期 2009.12.03
申请人 TOKYO ELECTRON LIMITED 发明人 NABEYAMA YUKI;AMANO TSUTOMU;WAKAMORI TSUTOMU
分类号 H01L21/02;H01L21/3065;H01L21/67 主分类号 H01L21/02
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