发明名称 |
LOAD LOCK APPARATUS AND VACUUM PROCESSING SYSTEM |
摘要 |
PURPOSE: A load lock device and a vacuum processing system are provided to prevent the generation of a particle due to an abrasion of a seal material by controlling the displacement of s seal surface on both ends of a partition. CONSTITUTION: A load lock device includes a vacuum preparing chamber with two up and down stages blocked with a partition(47). A pair of slits(101,102) are formed on the partition to vertically pass through the partition. The inside of the slit is a cavity and the upper and lower openings of the slit are sealed with an elastic plate. A reinforcement member is arranged to resist compressive force applied to the width direction of the slit. A partition includes a pressure control hole(50) from the inside of the slit to the seal surface.
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申请公布号 |
KR20100064346(A) |
申请公布日期 |
2010.06.14 |
申请号 |
KR20090119209 |
申请日期 |
2009.12.03 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
NABEYAMA YUKI;AMANO TSUTOMU;WAKAMORI TSUTOMU |
分类号 |
H01L21/02;H01L21/3065;H01L21/67 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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