发明名称 NITRIDE SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a nitride semiconductor device for inhibiting an increase in a leakage current via a buffer layer to prevent degradation of characteristics. SOLUTION: The nitride semiconductor device has an insulator region 8A in an AlGaN layer 4. Thus, even if strain occurs in the buffer layer 2 due to heat, shock or the like to cause current to easily flow to the buffer layer 2, the insulator region 8A prevents the current from flowing as indicated by the dotted arrow (a) in Fig.1. Thus, the increase in the leakage current via the buffer layer 2 can be inhibited to prevent degradation in the characteristics. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010129566(A) 申请公布日期 2010.06.10
申请号 JP20080299167 申请日期 2008.11.25
申请人 SHARP CORP 发明人 YAMASHITA MASAHARU
分类号 H01L21/338;H01L29/778;H01L29/812 主分类号 H01L21/338
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