发明名称 VACUUM APPARATUS, LIGHT SOURCE APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a vacuum apparatus by which a chamber is evacuated in a vacuum atmosphere while suppressing a change in temperature in the chamber, to provide a light source apparatus, to provide an exposure apparatus, and to provide a method of manufacturing a device. <P>SOLUTION: The vacuum apparatus connected to the chamber 15 in which the vacuum atmosphere is produced includes: a turbo molecular pump 34 for evacuating the chamber 15 or a communication portion 36 communicating with the inside of the chamber 15; a radiant heat absorbing mechanism 46 arranged nearby the turbo molecular pump 34 and reducing radiant heat radiated from the turbo molecular pump 34 into the chamber 15; and a controller which controls the temperature of the radiant heat absorbing mechanism 46 to a preset temperature. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010129687(A) 申请公布日期 2010.06.10
申请号 JP20080301227 申请日期 2008.11.26
申请人 NIKON CORP 发明人 SHIMODA TOSHIMASA;TACHIBANA MASATAKA;FUKAGAWA SHIGETA
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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