发明名称 ACIDIC EXHAUST GAS TREATMENT SYSTEM
摘要 PURPOSE: A system for processing acidic wastewater is provided to remove acidic gas and acid mist produced in a semiconductor process, and to improve removal efficiency of the acidic gas included in exhaust gas. CONSTITUTION: A system for processing acidic wastewater includes the following: a waste gas inlet(110) formed on one side; a waste gas outlet(120) formed on the other side; a housing(100) formed to a box shape; a first spraying part removing acidic gas by spraying water to waste gas including acidic gas; and a discharge dust collection part(600) collecting the dust mist flowed from the first spraying part by the corona discharge.
申请公布号 KR20100059597(A) 申请公布日期 2010.06.04
申请号 KR20080118430 申请日期 2008.11.26
申请人 PLASMA TECH CO., LTD. 发明人 PARK, JAE KYUNG
分类号 B01D47/06;B01D53/00 主分类号 B01D47/06
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