发明名称 Method and apparatus for preparing thin film
摘要 The present invention provides a method and an apparatus for preparing a silicon-containing solid film, which can form a thin film uniformly over a wide area. Raw-material fluid comprising a silane derivative and a hydrocarbon derivative is mixed with carrier fluid comprising carbon dioxide to form a supercritical condition. Further, an active-state is produced in the raw-material fluid of the supercritical fluid by a catalytic reaction with at least one metal catalyst selected from a group consisting of platinum, tungsten, cobalt, nickel, iron or an alloy of each of them. The fluid is blown to the substrate, thereby forming a silicon-containing solid film or a hydrocarbon-containing solid film on the substrate.
申请公布号 US7727597(B2) 申请公布日期 2010.06.01
申请号 US20050719806 申请日期 2005.09.30
申请人 TOKYO UNIVERSITY OF AGRICULTURE & TECH.;ITEC CO., LTD. 发明人 WATANABE EIZO;WATANABE TOSHIYUKI;SONE MASATO;MATSUOKA YOSHINORI;MIYAKE HIDEO;IIDA MASAYASU
分类号 B05D1/02;B05D5/00;B05D7/00;B28B19/00;C23C20/00;C23C28/00 主分类号 B05D1/02
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