| 摘要 |
A process for making glass sheet with low compaction suitable for high temperature applications, such as low-temperature polysilicon-based TFT displays, and glass sheets thus made. The glass sheet desirably has an anneal point of at least 765°C, a CTE at most 42x10 -7 /°C. The process involves cooling the glass melt form a temperature corresponding to a viscosity of 1.0x10 10 poise to a temperature corresponding to a viscosity of 1.0x10 15 poise at a cooling rate CR, where CR ‰¥ 5°G/second. The absolute value of the measured compaction of the glass sheet desirably is at most 175 ppm upon being re-heated to 675°C for a period of time.
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