| 摘要 |
<p>An exhaust system structure of film forming apparatus, comprising an exhaust pipe (51) for discharge of exhaust gas from a treatment vessel (11); an automatic pressure controller (52) provided at the portion of the exhaust pipe (51) near the treatment vessel (11); a vacuum pump (54) provided on the side of the exhaust pipe (51) downstream of the automatic pressure controller (52); an oxidizer supply section (57) for supplying an oxidizer at the location of the exhaust pipe (51) downstream of the automatic pressure controller (52); trap means (53) for recovery of products resulting from reactions of organometallic raw gas components and by-products contained in the exhaust gas with the oxidizer, provided on the side of the exhaust pipe (51) downstream of the oxidizer supply location; and a detoxifier (55) provided on the side of the exhaust pipe (51) downstream of the trap means (53).</p> |
