发明名称 METHOD FOR PRODUCING SINTERED BODY, SINTERED BODY, SPUTTERING TARGET COMPOSED OF THE SINTERED BODY, AND SPUTTERING TARGET-BACKING PLATE ASSEMBLY
摘要 Provided is a method of producing a sintered compact including the steps of mixing raw material powders respectively composed of a chalcogenide element and a Vb group element or raw material powders of an alloy of two or more elements including a chalcogenide element and a Vb group element, and hot pressing the mixed powder under conditions that satisfy the following formula: P(pressure) ‰¦{Pf/(Tf-T 0 )} × (T-T 0 ) + P 0 (Pf: final pressure, Tf: final temperature, P 0 : atmospheric pressure, T: heating temperature, T 0 : room temperature, and temperatures in Celsius). This method is able to produce a high-density, high-strength and large-diameter sintered compact containing a chalcogenide element (A) and a Vb group element (B) or containing the element (A) and (B) and additionally a IVb group element (C) and/or an additive element (D) which is free from cracks even when it is assembled and used as a sputtering target-backing plate assembly. Additionally disclosed are such a sintered compact, a sputtering target configured of such a sintered compact, and a sputtering target-backing plate assembly.
申请公布号 EP2186917(A1) 申请公布日期 2010.05.19
申请号 EP20080791262 申请日期 2008.07.17
申请人 NIPPON MINING & METALS CO., LTD. 发明人 TAKAHASHI, HIDEYUKI
分类号 C22C1/04;B22F3/14;B22F7/04;C22C12/00;C22C28/00;C23C14/34;H01J37/34 主分类号 C22C1/04
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