发明名称 Semiconductor device having align key and method of fabricating the same
摘要 Disclosed is a semiconductor device having an align key and a method of fabricating the same. The semiconductor device includes a semiconductor substrate having a cell area and an align key area. An isolation layer that defines a cell active area is disposed in the cell area of the semiconductor substrate. A cell charge storage layer pattern is disposed across the cell active area. An align charge storage layer pattern is disposed in the align key area of the semiconductor substrate. An align trench self-aligned with the align charge storage layer pattern is formed in the align key area of the semiconductor substrate.
申请公布号 US7718504(B2) 申请公布日期 2010.05.18
申请号 US20060535934 申请日期 2006.09.27
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM SANG-SU;CHO IN-WOOK;KIM MYEONG-CHEOL;LEE SUNG-WOO;KIM JIN-HEE;LEE DOO-YOUL;KIM SUNG-HO
分类号 H01L21/027;H01L21/76;H01L21/46;H01L21/8247;H01L23/544;H01L27/10;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/027
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