PATTERNING METHOD OF METAL LINE ON FLEXIBLE SUBSTRATE USING NANOIMPRINT LITHOGRAPHY

摘要

PURPOSE: A patterning method of a metal line on a flexible substrate using a nano-imprint lithography are provided to reduce process costs and a process time since an etching of a metal thin film and a lift-off process are not necessary. CONSTITUTION: A nano pattern(13) is formed on a first substrate(10) of a polymer material by using ultraviolet ray and pressure. Metal is evaporated over the second substrate(20) of the nano pattern on the first substrate and the polymer material. The deposited metal(15) on an emboss part of nano pattern is transcribed a deposited metal on the second substrate to form a metal wire(30). The film layer(7) is formed on a first substrate and a second substrate. The nano pattern is formed by an imprint equipment using the stamp(5).