| 摘要 |
<p>PURPOSE: A wavelength shift measuring device, a light source device, an interference measurement device, an exposure device, and a manufacturing method of the devices are provided to measure the precise light source wavelength. CONSTITUTION: A wavelength shift measuring device comprises an optical element, a spacer member and a photo electronic control sensor. The optical element partitions the flux injected from the light source into a plurality of fluxes. The optical element is created the coherent light and synthesizes 2 flux among a plurality of fluxes. The photo electronic control sensor outputs a plurality of interferential signals in which phase each other crosses each other based on the coherent light.</p> |
