A stereolithography apparatus and an exposure system for a stereolithography apparatus, wherein light emitting diodes are used as light sources. The invention relates to aligning light from the light emitting diode and to the exchange and control the light emitting diodes.
申请公布号
WO2010043557(A1)
申请公布日期
2010.04.22
申请号
WO2009EP63158
申请日期
2009.10.09
申请人
HUNTSMAN ADVANCED MATERIALS (SWITZERLAND) GMBH;POGEUOISE, EMILIE;LARSEN, NIELS HOM;GRELIN, JEROME;HANGAARD, OLE
发明人
POGEUOISE, EMILIE;LARSEN, NIELS HOM;GRELIN, JEROME;HANGAARD, OLE
