| 发明名称 |
VACUUM PROCESSING APPARATUS |
| 摘要 |
Disclosed herein is a vacuum processing apparatus for performing a desired process for a substrate after establishing a vacuum atmosphere therein. More particularly, the vacuum processing apparatus includes a vacuum chamber, which is divided into a chamber body and an upper cover. The upper cover is configured to be easily opened away from and closed to the chamber body.
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| 申请公布号 |
US2010089531(A1) |
申请公布日期 |
2010.04.15 |
| 申请号 |
US20090578796 |
申请日期 |
2009.10.14 |
| 申请人 |
ADVANCED DISPLAY PROCESS ENGINEERING, CO., LTD. |
发明人 |
LEE YOUNG JONG;CHOI JUN YOUNG;SON HYOUNG-KYU;LEE JEONG-BIN;KIM GYEONG-HOON;KIM HYUNG-SOO;HAN MYUNG-WOO |
| 分类号 |
C23F1/08;C23C16/00 |
主分类号 |
C23F1/08 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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