| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To solve the problem that offset variance of an ELG(resistance detection element) and a real element (magnetoresistive effect element) on a substrate caused as the magnetoresistive effect element of a CPP structure is narrowed becomes too large to ignore and becomes a bottleneck in achievement of higher accuracy of a MR element height. <P>SOLUTION: In the final floating surface polishing process of a rover 50, a resistance value of the ELG 2 and a resistance value of the real element 1 are detected (measured) in an area where the resistance value of the real element 1 is detectable (step 100). Then, offset values of the ELG 2 and the real element 1 are calculated based on the resistance value of the ELG 2 and the resistance value of the real element 1 detected in step 100 (step 102). Then, a final resistance value of the ELG 2 which becomes a polishing stop target is corrected by using the calculated offset values, and set as a final target (step 104). When the resistance value of the ELG 2 reaches the final resistance value, the floating surface polishing of the rover 50 is stopped. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
