发明名称 SUBSTRATE SUPPORTING/TRANSFERRING TRAY
摘要 To provide a substrate supporting/transferring tray, which can be placed on a substrate supporting part arranged in a treatment chamber in which the heat treatment is performed to a substrate, especially on a substrate supporting part having a built-in heating means for heating the substrate, and on an upper side of which, the substrate is placed. At the time of heat-treating the substrate, the substrate can be more uniformly heated, and when the heat treatment is completed, the tray can be easily removed from the substrate supporting part without waiting for the temperature of the substrate to be reduced, and can transfer the substrate to other parts from the treatment chamber in which the heat treatment is performed. The substrate supporting/transferring tray, which has the disc-shaped substrate supporting part on an upper plane side, and is provided with a cylindrical side wall part extending from a periphery of the disc-shaped substrate supporting part to a lower side, and an annular part extending from a lower end side of the cylindrical side wall part to an outer side in a diameter direction.
申请公布号 US2010084392(A1) 申请公布日期 2010.04.08
申请号 US20090632161 申请日期 2009.12.07
申请人 CANON ANELVA CORPORATION 发明人 SHIBAGAKI MASAMI;KUREMATSU YASUMI
分类号 F27D11/00;B23Q3/00 主分类号 F27D11/00
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