| 摘要 |
PROBLEM TO BE SOLVED: To provide a mask inspecting device and a mask inspecting method capable of precisely performing mask inspection by enabling elimination of distortion of optical images caused by bending of a mirror and flexure of a mask. SOLUTION: An optical image of pattern drawn on a mask is acquired while using measurement results of a laser interferometer with a stage which holds the mask moving in X-direction and Y-direction (S100). Position deviation of the acquired optical image is corrected using a polynomial where previously measured amount of position deviation of the optical image is fitted (S102). Residual position deviation after the polynomial correction is corrected by using a map describing previously measured amount of position deviation (S104). The optical image after the map correction is compared with a reference image (S108). COPYRIGHT: (C)2010,JPO&INPIT
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