发明名称 |
RUTHENIUM COMPOUND AND PROCESS FOR PRODUCING METALLIC RUTHENIUM FILM |
摘要 |
A ruthenium compound capable of forming filmy metallic ruthenium of good quality; and a process for producing a metallic ruthenium film which comprises using the ruthenium compound to produce the film by chemical vapor deposition. The ruthenium compound as a material for chemical vapor deposition is represented by, e.g., the following formula (1).
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申请公布号 |
KR20100034062(A) |
申请公布日期 |
2010.03.31 |
申请号 |
KR20107005935 |
申请日期 |
2003.09.17 |
申请人 |
JSR CORPORATION |
发明人 |
SAKAI TATSUYA;HASHIMOTO SACHIKO;MATSUKI YASUO |
分类号 |
C07F15/00;C07C51/00;C23C16/18 |
主分类号 |
C07F15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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