发明名称 |
Projection optical system and method for photolithography and exposure apparatus and method using same |
摘要 |
An optical system for ultraviolet light includes a plurality of optical elements made of a material transparent to ultraviolet light. At least two of the optical elements are utilized for forming at least one liquid lens group that has a first delimiting optical element, a second delimiting optical element, and a liquid lens, which is arranged in an interspace between the first delimiting optical element and the second delimiting optical element and contains a liquid transparent to ultraviolet light.
|
申请公布号 |
US7688517(B2) |
申请公布日期 |
2010.03.30 |
申请号 |
US20070907801 |
申请日期 |
2007.10.17 |
申请人 |
|
发明人 |
OMURA YASUHIRO;IKEZAWA HIRONORI |
分类号 |
G02B3/00;G02B1/06;G02B13/14;G02B13/18;G02B13/24;G02B17/00;G02B17/08;G03F7/20;H01L21/027 |
主分类号 |
G02B3/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|