发明名称 Projection optical system, exposure system, and exposure method
摘要 An imaging optical system is a system of a liquid immersion type permitting a plane-parallel plate in liquid to be replaced with another, without substantial degradation of imaging performance, while ensuring sufficiently high laser resistance of a boundary lens. The imaging optical system is provided with a first optically transparent member located nearest to a second plane, and a second optically transparent member located adjacent to the first optically transparent member. An optical path between the first optically transparent member and the second plane is fillable with a first liquid and an optical path between the first optically transparent member and the second optically transparent member is fillable with a second liquid. The imaging optical system satisfies the condition of 1<D1/(M1+M2)<20, where D1 is a center thickness of the first optically transparent member, M1 a center thickness of a layer of the first liquid, and M2 a center thickness of a layer of the second liquid.
申请公布号 US7688422(B2) 申请公布日期 2010.03.30
申请号 US20050665490 申请日期 2005.10.12
申请人 NIKON CORPORATION 发明人 IKEZAWA HIRONORI;OMURA YASUHIRO
分类号 G03B27/42;G03B27/54;G03B27/58 主分类号 G03B27/42
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