发明名称 VACUUM PROCESSING APPARATUS
摘要 On a cover (3) of a vacuum processing chamber (2), a groove (150) is annularly formed along the periphery of an opening section to be a gas channel. In the groove (150), a metal seal (140), which has an annular shape (O-ring shape) as a whole and a double structure, is arranged. On the cover (3), an annular recessed section (160) is formed to surround the periphery of the groove (150), on the outer portion of the groove (150). On the side of a flange section (130), an annular protruding section (170) which corresponds to the recessed section (160) is formed. In the recessed section (160), a fitting mechanism (180) for fitting the protruding section (170) is constituted.
申请公布号 KR20100031679(A) 申请公布日期 2010.03.24
申请号 KR20097026338 申请日期 2008.06.13
申请人 TOKYO ELECTRON LIMITED 发明人 LI YICHENG
分类号 H01L21/205;C23C16/44 主分类号 H01L21/205
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