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发明名称
Vorrichtung zur Herstellung von photolithographischen Strukturen, insbesondere auf Halbleiterkristalloberflächen
摘要
申请公布号
AT263088(B)
申请公布日期
1968.07.10
申请号
AT19660011220
申请日期
1966.12.05
申请人
SIEMENS AKTIENGESELLSCHAFT
发明人
分类号
G03F7/20;H01L21/027
主分类号
G03F7/20
代理机构
代理人
主权项
地址
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