RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD

摘要

Disclosed is a radiation-sensitive resin composition which enables the production of a good pattern shape, has excellent basic resist properties such as sensitivity, resolution, LWR, image defectiveness and pattern collapse resistance, can prevent the occurrence of water mark defects and bubble defects during immersion exposure, and enables the production of a resist film having a satisfactorily water-repellent surface.  Also disclosed is a method for forming a resist pattern by using the resin composition.  The resin composition comprises: a resin (A) which contains a repeating unit that can become alkali-soluble by the action of an acid and does not contain any repeating unit containing a fluorine atom; (B) a radiation-sensitive acid generator; (C) a fluorinated resin which contains a repeating unit that can become alkali-soluble by the action of an acid and also contains a repeating unit containing a fluorine atom; and (D) a lactone compound, wherein the content of the lactone compound (D) is 31 to 200 parts by mass relative to 100 parts by mass of the resin (A).