CHARGED PARTICLE BEAM DEVICE

摘要

A charged particle beam device is provided with a configuration of irradiating a substrate (6) comprising a circuit pattern with a primary charged particle beam (2), continuously moving the substrate at a constant speed or while increasing or decreasing speed, monitoring a position resulting from the movement, controlling the position of irradiation with the primary charged particle beams according to coordinates on the substrate, detecting the image of a partial region of the substrate at a speed lower than the speed of the movement, detecting a defect candidate on the basis of the detected image, and displaying the detected defect candidate in a map format. Thus, a substrate inspection device using an electron beam which is capable of extracting a defect candidate at a higher speed than ever before can be provided.