发明名称 Mask and method for electrokinetic deposition and patterning process on substrates
摘要 A mask for application to a substrate to facilitate electrokinetic deposition of charged particles onto the substrate, the mask comprising a conducting layer, a dielectric layer, and mask openings. A method for applying a pattern of charged particles to a substrate comprising applying the foregoing the substrate to yield a masked substrate; immersing the masked substrate in a bath containing the charged particles; and establishing an electrical potential between the conducting layer of the mask and a counter-electrode thereby electrokinetically depositing the particles through the mask openings onto areas of the substrate exposed in the mask openings. Products made by this method.
申请公布号 US7678255(B2) 申请公布日期 2010.03.16
申请号 US20060419128 申请日期 2006.05.18
申请人 FRY'S METALS, INC. 发明人 KHASELEV OSCAR;LEWIS BRIAN G.;MARCZI MICHAEL;SINGH BAWA
分类号 C25D13/12;G03G13/32 主分类号 C25D13/12
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