| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of forming a coating film having uniform film thickness, and a photosensitive resin transfer material hardly causing failure in releasing a cover film, to provide a photospacer using these materials and a method of manufacturing the same, and to provide a substrate for a display device capable of displaying an image of high image quality by preventing display unevenness and a display device using it. <P>SOLUTION: The photosensitive resin composition contains fluorine-contained compound including a repeating unit expressed by general formula (A). The photosensitive resin transfer material is formed using the photosensitive resin composition. The photospacer uses these materials. The method of manufacturing the photospacer uses these materials. The substrate for a display device includes the photospacer, and the display device includes the substrate. In the general formula (A), R<SB>1</SB>-R<SB>3</SB>indicates a hydrogen atom or a methyl group, L<SB>1</SB>-L<SB>3</SB>indicates -O- or -NH-, n and m indicates integral numbers of 1 to 10 (m≠n), l indicates an integral number of 1 to 15, X, Y and Z indicate the mass ratio of each repeating unit, X+Y=20-80, Z=80-20, and X and Y are not 0 at the same time. <P>COPYRIGHT: (C)2010,JPO&INPIT |
