发明名称 CHARGE STORAGE DEVICES AND METHOD FOR MANUFACTURING THE SAME
摘要 PURPOSE: A charge storage device and a method for manufacturing the same are provided to reduce the manufacturing cost of a memory device by forming a charge storage layer and a blocking insulation layer using an identical mixing gas. CONSTITUTION: A tunneling insulation layer(13) is formed on a substrate(11). A charge storage layer(15) is formed on the tunneling insulation layer and includes a first band gap energy. A blocking insulation layer(17) including a second band gap energy is formed on the charge storage layer. A control gate(19) is formed on the blocking insulation layer. The composition ratio of a mixing gas for the charge storage layer is different from the composition ratio for the blocking insulation layer.
申请公布号 KR20100026639(A) 申请公布日期 2010.03.10
申请号 KR20080085716 申请日期 2008.09.01
申请人 SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION 发明人 YI, JUN SIN;SON, HYUK JOO;JUNG, SUNG WOOK;KIM, JAE HONG;CHO, JAE HYUN;JANG, KYUNG SOO;HEO, JONG KYU
分类号 H01L21/8247 主分类号 H01L21/8247
代理机构 代理人
主权项
地址
您可能感兴趣的专利