| 摘要 |
PURPOSE: An apparatus for reducing dissolved oxygen and a method for thereof are provided to remarkably reduce dissolved oxygen from ultra-pure water necessary for a manufacturing process of a semiconductor device, and to improve producing quality by simplifying the facility of removing the dissolved oxygen. CONSTITUTION: An apparatus for reducing dissolved oxygen comprises the following: an ultra-pure water pathway(10) to flow ultra-pure water; an inert gas input pathway(60) supplying the inert gas while connected to the ultra-pure water pathway; a mixer(90) to mix the ultra-pure water and the inert gas while connected to the end of the ultra-pure water pathway; and a bubble removing tank(100) separating the inert gas contained in the ultra-pure water while connected to the mixer. The inert gas is nitrogen. The mixer substitutes the dissolved oxygen included in the mixture of the nitrogen and ultra-pure water with the nitrogen. The bubble removing tank centrifugal separates liquid and gas using a rotator installed inside.
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