发明名称 Method of producing a thin conductive metal film
摘要 The present invention relates to a metal oxide dispersion, which can form a metal thin film onto a substrate by heat treatment at a low temperature, wherein a metal oxide having a particle diameter of less than 200 nm is dispersed in the dispersion medium. By heat treating the dispersion after applying it onto a substrate, a metal thin film is formed.
申请公布号 US7674401(B2) 申请公布日期 2010.03.09
申请号 US20040497602 申请日期 2004.06.03
申请人 ASAHI KASEI KABUSHIKI KAISHA 发明人 MARUYAMA MUTSUHIRO
分类号 H01B1/00;C23C24/08;C23C26/00;H05K1/09 主分类号 H01B1/00
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