发明名称 Compound semiconductor device and the fabricating method of the same
摘要 A GaN layer functions as an electron transit layer and is formed to exhibit, at least at a portion thereof, A/B ratio of 0.2 or less obtained by a photoluminescence measurement, where“A”is the light-emission intensity in the 500-600 nm band, and“B”is the light-emission intensity at the GaN band-edge.
申请公布号 US2010051962(A1) 申请公布日期 2010.03.04
申请号 US20090591031 申请日期 2009.11.05
申请人 FUJITSU LIMITED 发明人 KIKKAWA TOSHIHIDE;IMANISHI KENJI
分类号 H01L29/20;H01L21/18;H01L21/205;H01L21/338;H01L29/778;H01L29/812 主分类号 H01L29/20
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