发明名称 Tablet, useful for pharmaceutical preparation, comprises a many individual powder particles, where a part of the tablet surface is a diffractive microstructure, which are impressed into the surface of the individual powder particles
摘要 #CMT# #/CMT# Tablet for pharmaceutical use comprises a many individual powder particles, where at least a part of the surface of tablet is a diffractive microstructure (11), which can be perceived in the visible spectral range and shows a visual safety feature, and the diffractive microstructure are impressed into the surface of the individual powder particles. #CMT# : #/CMT# Independent claims are included for: (1) a compression tool (1, 1a, 1b, 3) for producing the tablet comprising a pressing surface of the compression tool microstructure, where the microstructure have dimensions, which are smaller than the dimension of the individual crystallites of the material of the pressing surface; (2) compression press with at least the compression tool; and (3) preparation of microstructure on the surface of a tool, preferably compression tool comprising applying a photo resist layer on the surface; exposing the photo resist layer with a microstructure; developing the photo resist layer; transmitting the microstructure on the photo resist layer to the surface of the tool by dry etching and removing the photo resist layer. #CMT#USE : #/CMT# The tablet is useful for pharmaceutical preparation (claimed). #CMT#ADVANTAGE : #/CMT# The process provides increased temperature and pressure, such that the process is less time consuming. The preparation of the tablet involves tablet compression tool, such that the process is compatible and inexpensive. The diffractive microstructure surface protects the tablet from mechanical damage during entire product life cycle, particularly against abrasive force. #CMT#DESCRIPTION OF DRAWINGS : #/CMT# The figure shows the compression tool used for the production of tablet: 1a : Press stamp 11 : Lattice-microstructure. #CMT#PHARMACEUTICALS : #/CMT# Preferred Process: The step of exposing the photo resist layer takes place through interfering laser beam. The macroscopic structure of the microstructure is produced by a shadow mask. Before dry etching on the projecting part of the microstructure of the photo resist layer, a metal crest is applied, preferably by inclined vaporization. Before the dry etching the non-coated metal part of the photo resist layer is removed by oxygen plasma. The inverse form of the microstructure is impressed into the surface of the compression tool. The hardness in vickers-hardness grade of the microstructure of the head tool is greater than the compression tool. The tension applied during the impression of the microstructure is larger than the stretch boundary and lower than the ultimate tensile stress of the material of the tool, and simultaneously lower than the stretch boundary and given as ultimate tensile stress of the material of the head tool. After impression of the microstructure, the tool surface is hardened. Preferred Components: The tablet with a transparent coating provides a visible spectral range, where the tablet material shows a different refractive index, preferably with a difference of at least 0.2. The coating of the refractive index is higher than the refractive index of the tablet material, and the thickness of the coating is less than of 1 mu m. The tablet shows at least a depression on its surface, in which the lattice microstructure is arranged. The tablet is produced by direct compression. The microstructure is present on a part of the press surface. The diffractive lattice microstructure in the visible spectral range shows a recognizable diffracting effect. The compression tool is a compression stamp. The tablet compression is rotation press. The lattice microstructure shows a relief with an essentially triangular or sinusoidal profile. The lattice microstructure is linear- or breadboard-lattice. The period length of the lattice microstructure is 300-5000 nm, preferably 800-2500 nm. The depth of the relief between the lattice lines of the lattice microstructure is at least 80 nm, preferably 1000 nm. The depth of the relief between the lattice lines of the lattice microstructure is 0.3 and the period length of the lattice microstructure is 0.4.
申请公布号 CH699360(B1) 申请公布日期 2010.02.26
申请号 CH20070000043 申请日期 2007.01.12
申请人 CSEM CENTRE SUISSE D'ELECTRONIQUE ET DE MICROTECHNIQUE SA -RECHERCHE ET DEVELOPPEMENT 发明人 HARALD WALTER;ALEXANDER STUCK;CHRISTIAN ZSCHOKKE;JUERGEN SOECHTIG
分类号 A61J3/10 主分类号 A61J3/10
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