| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition, having excellent developability in forming a pattern film made of a hardened material of a photosensitive composition by exposure and development, and further restraining corrosion of metal when metal wiring is formed on the pattern film, and a method of manufacturing a pattern film using the photosensitive composition. <P>SOLUTION: The photosensitive composition includes: a siloxane polymer having SiOH group and an olefinic double bond and a photoradical generating agent. According to the method of manufacturing a pattern film 1A, after the photosensitive composition is coated on a substrate 2 to form a photosensitive composition layer 1 on the substrate 2, the photosensitive composition layer 1 is partially exposed to harden of the photosensitive composition layer 1 of an exposed part 1a and made insoluble to a developing liquid, and subsequently the photosensitive composition layer 1 is developed by the developing liquid to eliminate the photosensitive composition layer 1 of an unexposed part 1b and form a pattern film 1A made of a hardened material of the photosensitive composition. <P>COPYRIGHT: (C)2010,JPO&INPIT |
