发明名称 GAS DELIVERY SYSTEM WITH CONSTANT OVERPRESSURE RELATIVE TO AMBIENT TO SYSTEM WITH VARYING VACUUM SUCTION
摘要 A system comprising: a plasma production chamber configured to produce a plasma; a reaction chamber vaporize a precursor material with the plasma to form a reactive mixture; a quench chamber having a frusto-conical surface and a quench region formed within the quench chamber between an ejection port of the reaction chamber and a cooled mixture outlet, wherein the quench region configured to receive the reactive mixture from the ejection port, to cool the reactive mixture to form a cooled mixture, and to supply the cooled mixture to the cooled mixture outlet; and a conditioning fluid injection ring disposed at the ejection port and configured to flow a conditioning fluid directly into the reactive mixture as the reactive mixture flows through the ejection port, thereby disturbing the flow of the reactive mixture, creating turbulence within the quench region and cooling the reactive mixture to form a cooled mixture comprising condensed nanoparticles.
申请公布号 EP2152453(A1) 申请公布日期 2010.02.17
申请号 EP20080754270 申请日期 2008.05.09
申请人 SDC MATERIALS, INC. 发明人 LAYMAN, FREDERICK, P.
分类号 B22F9/14 主分类号 B22F9/14
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