发明名称 Capacitor structure and fabricating method thereof
摘要 Disclosed are a vertical-type capacitor and a formation method thereof. The capacitor includes a first electrode wall and a second electrode wall perpendicular to a semiconductor substrate, and at least one dielectric layer on the substrate to insulate the first electrode wall from the second electrode wall. The first electrode wall includes a plurality of first conductive layers and a plurality of first contacts, the plurality of first conductive layers being interconnected with each other by each of the plurality of first contacts. The second electrode wall includes a plurality of second conductive layers and a plurality of second contacts, the plurality of second conductive layers being interconnected with each other by each of the plurality of second contacts.
申请公布号 US7662695(B2) 申请公布日期 2010.02.16
申请号 US20080149795 申请日期 2008.05.08
申请人 DONGBU ELECTRONICS CO. LTD. 发明人 CHOI CHEE HONG
分类号 H01L21/20 主分类号 H01L21/20
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