CLEANING METHOD BY ELECTROLYTIC SULFURIC ACID AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a cleaning method by electrolytic sulfuric acid improved in the current efficiency for producing the electrolytic sulfuric acid, and enhancing cleaning/peeling efficiency of resist or the like at the same time; and to provide a method of manufacturing a semiconductor device.

SOLUTION: The cleaning method by electrolytic sulfuric acid includes steps of: supplying a first sulfuric acid solution from outside to a sulfuric acid electrolysis tank 1 to perform electrolysis to produce a first electrolytic sulfuric acid containing an oxidizing substance in the sulfuric acid electrolysis tank 1; supplying a second sulfuric acid solution, which is higher in concentration than the first sulfuric acid solution previously supplied, from the outside to the sulfuric acid electrolysis tank 1 to mix the second sulfuric acid with the first electrolytic sulfuric acid in the sulfuric acid electrolysis tank 1, and performing electrolysis to produce a cleaning solution comprising a second electrolytic sulfuric acid containing sulfuric acid and an oxidizing substance in the sulfuric acid electrolysis tank 1; and performing a cleaning treatment for a cleaning object 23 by using the cleaning solution. The method of manufacturing a semiconductor device using the cleaning method is also provided.

COPYRIGHT: (C)2010,JPO&INPIT