发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 A p-type region is provided on a first n-type region. A second n-type region is provided on the p-type region, spaced apart from the first n-type region by the p-type region. A gate electrode serves to form an n-channel between the first and second n-type regions. A first electrode is electrically connected to each of the p-type region and the second n-type region. A second electrode is provided on the first n-type region such that it is spaced apart from the p-type region by the first n-type region and at least a part thereof is in contact with the first n-type region. The second electrode is made of any of metal and alloy and serves to inject holes into the first n-type region.
申请公布号 US2010032711(A1) 申请公布日期 2010.02.11
申请号 US20080344947 申请日期 2008.12.29
申请人 MITSUBISHI ELECTRIC CORPORATION 发明人 AONO SHINJI;MORITANI JUNICHI
分类号 H01L29/739;H01L21/331 主分类号 H01L29/739
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