| 摘要 |
Laser processing is enhanced by using endpointing or by using a charged particle beam together with a laser. Endpointing uses emissions, such as photons, electrons, ions, or neutral particles, from the substrate to determine when the material under the laser has changed or is about to change. Material removed from the sample can be deflected to avoid deposition onto the laser optics. |
| 申请人 |
FEI COMPANY;STRAW, MARCUS;TOTH, MILOS;UTLAUT, MARK;NARUM, DAVID, H.;KNIPPELS, GUIDO;VEEN, GERARDUS NICOLAAS ANNE VAN |
发明人 |
STRAW, MARCUS;TOTH, MILOS;UTLAUT, MARK;NARUM, DAVID, H.;KNIPPELS, GUIDO;VEEN, GERARDUS NICOLAAS ANNE VAN |
