APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

摘要

PURPOSE: An apparatus and a method for processing a substrate are provided to detect a process end point by receiving the light through an optical fiber while controlling the optimized angle after databasing the optimized angle value according to the property of the process. CONSTITUTION: A chamber(10) offers an internal space for loading a substrate. An end point detection unit(30) receives a light receiver and detects a process end point. The light receiver receives the light from the plasma generated in the chamber. A light conversion unit(20) is arranged in a front end of the light receiver and converts the amplitude of the light. The light conversion unit is arranged in parallel and includes a first polarizer and a second polarizer which the light passes through.