| 发明名称 |
CONTROLS OF AMBIENT ENVIRONMENT DURING WAFER DRYING USING PROXIMITY HEAD |
| 摘要 |
A method for processing a substrate is provided which includes generating a fluid meniscus to process the substrate and applying the fluid meniscus to a surface of the substrate. The method further includes reducing evaporation of fluids from a surface in the substrate processing environment.
|
| 申请公布号 |
US2009320884(A1) |
申请公布日期 |
2009.12.31 |
| 申请号 |
US20090555217 |
申请日期 |
2009.09.08 |
| 申请人 |
KOROLIK MIKHAIL;LARIOS JOHN M DE;RAVKIN MIKE;FARBER JEFFREY |
发明人 |
KOROLIK MIKHAIL;LARIOS JOHN M. DE;RAVKIN MIKE;FARBER JEFFREY |
| 分类号 |
B08B3/00;C25D5/22;C25D7/12;H01L21/00 |
主分类号 |
B08B3/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
