发明名称 PHOTOPOLYMERIZABLE RESIN COMPOSITION
摘要 <p>PURPOSE: A photosensitive resin composition for a light-shielding layer, and a thin film transistor substrate containing a color filter formed by using the composition are provided to improve the easiness of aligning process even if a color filter is formed on an array substrate and to improve the transmittance to the light of a specific wavelength. CONSTITUTION: A photosensitive resin composition for a light-shielding layer has a transmittance 40 % or more to the light having a wavelength of 1,000-2,500 nm and an optical density of 3.0 or greater when a cured film having a thickness of 2.0-2.5 micrometers is formed. The photosensitive resin composition comprises a colorant containing at least two kinds of pigment mixing components capable of being mixed so as to express a black color. The pigment mixing components comprises a red pigment and a blue pigment as an essential component, and comprises further a yellow pigment, a green pigment or their mixture.</p>
申请公布号 KR20090132088(A) 申请公布日期 2009.12.30
申请号 KR20080058172 申请日期 2008.06.20
申请人 KOLON INDUSTRIES, INC. 发明人 AHN, KYUNG WON;YOON, KYUNG KEUN;HAN, JAE GOOK;SUH, YOUNG SUNG
分类号 G03F7/004 主分类号 G03F7/004
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