发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor device that is stuck to a member, such as a semiconductor wafer, at low temperature and prevents bubbles from being generated easily between an adhesive film and a support member when sticking, for example, the adhesive film to the support member. <P>SOLUTION: In the method for manufacturing the semiconductor device, a first varnish containing a first adhesive resin composition and a second varnish containing a second adhesive resin composition different from the first one are overlapped onto a base material 2. Then, the first and second varnishes are dried to form an adhesive film 1 on the base material 2. A semiconductor wafer W is stuck to a high-tack surface A of the adhesive film 1. The semiconductor wafer W is cut. A semiconductor element 8 having an adhesive layer is picked up and adhered to a wiring board. In an adhesive layer 7, a recess formed between lines is embedded when heating at 170°C for two hours. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2009302496(A) 申请公布日期 2009.12.24
申请号 JP20080232620 申请日期 2008.09.10
申请人 HITACHI CHEM CO LTD 发明人 OZAKI YOSHINOBU;HATAKEYAMA KEIICHI;MASUKO TAKASHI;NAKAMURA YUKI;MIYAHARA MASANOBU
分类号 H01L21/52;H01L21/301 主分类号 H01L21/52
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