发明名称 Holographic lithography
摘要 A method and system for generating holographic diffraction patterns is disclosed. The method includes the steps of defining at least one geometrical shape; generating at least one line segment to represent the at least one geometrical shape; calculating a line diffraction pattern on a hologram plane, including calculating the Fresnel diffraction equation for an impulse representing the at least one line segment with a line width control term and a line length control term; and adding vectorially, where there are two or more line segments, the line diffraction patterns to form the holographic diffraction pattern. The method enables generation of two and three-dimensional shapes through the use of the line width and line length control terms and identifying where any lines cross so that the diffraction pattern can be suitably corrected.
申请公布号 GB2419501(B) 申请公布日期 2009.12.23
申请号 GB20040023170 申请日期 2004.10.19
申请人 UNIVERSITY OF DURHAM 发明人 RICHARD PETER MCWILLIAM;ANDREW MAIDEN;SIMON JOHNSON;ALAN PURVIS;PETER ANTHONY IVEY;NICHOLAS LUKE SEED;GAVIN LEWIS WILLIAMS
分类号 G03H1/00;G03F1/00;G03F7/00;G03F7/20;G03H1/08;H05K1/00;H05K3/00 主分类号 G03H1/00
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