发明名称 |
DUMMY EXPOSURE SUBSTRATE AND METHOD OF MANUFACTURING THE SAME, IMMERSION EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technology which is advantageous for dummy exposure in immersion exposure. <P>SOLUTION: A dummy exposure substrate 30 is used for the dummy exposure in an immersion exposure apparatus which exposes a substrate via a projection optical system and liquid. The dummy exposure substrate 30 includes: a lyophilic region 10; and a liquid-repellent region 20 surrounding the lyophilic region 10. <P>COPYRIGHT: (C)2010,JPO&INPIT |
申请公布号 |
JP2009295933(A) |
申请公布日期 |
2009.12.17 |
申请号 |
JP20080150842 |
申请日期 |
2008.06.09 |
申请人 |
CANON INC |
发明人 |
KITAMURA TSUTOMU;YABU NOBUHIKO |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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