发明名称 DUMMY EXPOSURE SUBSTRATE AND METHOD OF MANUFACTURING THE SAME, IMMERSION EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a technology which is advantageous for dummy exposure in immersion exposure. <P>SOLUTION: A dummy exposure substrate 30 is used for the dummy exposure in an immersion exposure apparatus which exposes a substrate via a projection optical system and liquid. The dummy exposure substrate 30 includes: a lyophilic region 10; and a liquid-repellent region 20 surrounding the lyophilic region 10. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009295933(A) 申请公布日期 2009.12.17
申请号 JP20080150842 申请日期 2008.06.09
申请人 CANON INC 发明人 KITAMURA TSUTOMU;YABU NOBUHIKO
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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